中国DUV光刻追赶ASML

Asia Times报道称，中国DUV光刻技术仍落后ASML约四代，关键差距体现在套刻精度、产能稳定性和生态配套。文章认为国产替代虽在推进，但先进制程设备瓶颈仍限制中国半导体自主化速度。

事件进展（2 篇报道）

1. 2026-08-03 00:32
   Reddit r/technology China's DUV lithography still lags ASML by four generations - Asia Times
2. 2026-08-02 21:22
   Reddit r/hardware EXCLUSIVE: China starts production of home-grown immersion DUV chipmaking tools, source says | Reuters

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